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Charging and the secondary electron-electron emission on a trench surface: broadening and shift of ion energy spectrum at plasma trench etching

dc.contributor.authorPalov, A P
dc.contributor.authorMankelevich, Yu A
dc.contributor.authorRakhimova, T V
dc.contributor.authorShamiryan, Denis
dc.date.accessioned2021-10-18T19:59:26Z
dc.date.available2021-10-18T19:59:26Z
dc.date.issued2010
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17757
dc.sourceIIOimport
dc.titleCharging and the secondary electron-electron emission on a trench surface: broadening and shift of ion energy spectrum at plasma trench etching
dc.typeJournal article
dc.source.peerreviewyes
dc.source.beginpage75203
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue7
dc.source.volume43
imec.availabilityPublished - imec


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