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Qualification of spreading resistance probe operations

dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-09-30T08:00:56Z
dc.date.available2021-09-30T08:00:56Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1775
dc.sourceIIOimport
dc.titleQualification of spreading resistance probe operations
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage4.1
dc.source.endpage4.15
dc.source.conference4th International Workshop on the Measurement, Characterization and Modelling of Ultra-Shallow Doping Profiles in Semiconductors
dc.source.conferencedate6/04/1997
dc.source.conferencelocationResearch Triangle Park, NC USa
imec.availabilityPublished - open access


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