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Characterization of EUV optics contamination due to photoresist related outgassing

dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorSteinhoff, J.
dc.contributor.authorVan Dijk, J.
dc.date.accessioned2021-10-18T20:23:41Z
dc.date.available2021-10-18T20:23:41Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17818
dc.sourceIIOimport
dc.titleCharacterization of EUV optics contamination due to photoresist related outgassing
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76361W
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7636


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