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Deposition Of Ru and RuO2 flms for DRAM electrode

dc.contributor.authorSchaekers, Marc
dc.contributor.authorCapon, B.
dc.contributor.authorDetavernier, C.
dc.contributor.authorBlasco, N.
dc.date.accessioned2021-10-18T21:19:41Z
dc.date.available2021-10-18T21:19:41Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17953
dc.sourceIIOimport
dc.titleDeposition Of Ru and RuO2 flms for DRAM electrode
dc.typeMeeting abstract
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1425
dc.source.conference218th ECS Meeting Symposium 'Atomic Layer Deposition Applications 6'
dc.source.conferencedate10/10/2010
dc.source.conferencelocationLas Vegas, NV USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. MA 2010-02


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