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Development of ALD HfZrOx with TDEAH, TDEAZ and H2O

dc.contributor.authorShi, Xiaoping
dc.contributor.authorTielens, Hilde
dc.contributor.authorTakeoka, Shinji
dc.contributor.authorNakabayashi, Takashi
dc.contributor.authorNyns, Laura
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSchram, Tom
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorSchaekers, Marc
dc.contributor.authorDate, Lucien
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-18T21:29:37Z
dc.date.available2021-10-18T21:29:37Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17976
dc.sourceIIOimport
dc.titleDevelopment of ALD HfZrOx with TDEAH, TDEAZ and H2O
dc.typeProceedings paper
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage699
dc.source.endpage704
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate18/03/2010
dc.source.conferencelocationShanghai China
dc.identifier.urlhttp://www.ecsdl.org/dbt/dbt.jsp?KEY=ECSTF8&Volume=27&Issue=1#MAJOR6
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 27, Issue 1


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