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EUV process sensitivities and optimizations for track processing

dc.contributor.authorShite, Hideo
dc.contributor.authorBradon, Neil
dc.contributor.authorNafus, Kathleen
dc.contributor.authorKitano, Junichi
dc.contributor.authorKosugi, Hitoshi
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorFoubert, Philippe
dc.contributor.authorGronheid, Roel
dc.contributor.authorJehoul, Christiane
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorGoethals, Mieke
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-18T21:31:38Z
dc.date.available2021-10-18T21:31:38Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17980
dc.sourceIIOimport
dc.titleEUV process sensitivities and optimizations for track processing
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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