dc.contributor.author | Siew, Yong Kong | |
dc.contributor.author | Cockburn, Andrew | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Versluijs, Janko | |
dc.contributor.author | Kunnen, Eddy | |
dc.contributor.author | Dekkers, Harold | |
dc.contributor.author | Volders, Henny | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Gravey, Virginie | |
dc.contributor.author | Noori, Atif | |
dc.contributor.author | Padhi, Deenesh | |
dc.contributor.author | Shah, Kavita | |
dc.date.accessioned | 2021-10-18T21:32:59Z | |
dc.date.available | 2021-10-18T21:32:59Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17983 | |
dc.source | IIOimport | |
dc.title | Spacer defined double patterning for 20nm half pitch interconnect damascene structures | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Siew, Yong Kong | |
dc.contributor.imecauthor | Cockburn, Andrew | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Versluijs, Janko | |
dc.contributor.imecauthor | Dekkers, Harold | |
dc.contributor.imecauthor | Volders, Henny | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.orcidimec | Dekkers, Harold::0000-0003-4778-5709 | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.source.peerreview | no | |
dc.source.conference | Applied Materials Engineering Technology Conference | |
dc.source.conferencedate | 15/06/2010 | |
dc.source.conferencelocation | Treviso Italy | |
imec.availability | Published - imec | |