dc.contributor.author | Siew, Yong Kong | |
dc.contributor.author | Versluijs, Janko | |
dc.contributor.author | Kunnen, Eddy | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Alaerts, Wilfried | |
dc.contributor.author | Dekkers, Harold | |
dc.contributor.author | Volders, Henny | |
dc.contributor.author | Suhard, Samuel | |
dc.contributor.author | Cockburn, Andrew | |
dc.contributor.author | Sleeckx, Erik | |
dc.contributor.author | Van Besien, Els | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.contributor.author | Noori, Atif | |
dc.contributor.author | Padhi, Deenesh | |
dc.contributor.author | Shah, Kavita | |
dc.contributor.author | Gravey, Virginie | |
dc.contributor.author | Beyer, Gerald | |
dc.date.accessioned | 2021-10-18T21:33:34Z | |
dc.date.available | 2021-10-18T21:33:34Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17984 | |
dc.source | IIOimport | |
dc.title | Integration of 20nm half pitch single damascene copper trenches by spacer-defined double patterning (SDDP) on metal hard mask (MHM) | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Siew, Yong Kong | |
dc.contributor.imecauthor | Versluijs, Janko | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Alaerts, Wilfried | |
dc.contributor.imecauthor | Dekkers, Harold | |
dc.contributor.imecauthor | Volders, Henny | |
dc.contributor.imecauthor | Suhard, Samuel | |
dc.contributor.imecauthor | Cockburn, Andrew | |
dc.contributor.imecauthor | Sleeckx, Erik | |
dc.contributor.imecauthor | Van Besien, Els | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.contributor.orcidimec | Dekkers, Harold::0000-0003-4778-5709 | |
dc.contributor.orcidimec | Sleeckx, Erik::0000-0003-2560-6132 | |
dc.contributor.orcidimec | Van Besien, Els::0000-0002-5174-2229 | |
dc.source.peerreview | yes | |
dc.source.conference | IEEE International Interconnect Technology Conference - IITC | |
dc.source.conferencedate | 7/06/2010 | |
dc.source.conferencelocation | Burlingame, CA USA | |
imec.availability | Published - imec | |