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Techniques for removal of contamination from EUVL mask without surface damage

dc.contributor.authorSingh, Sherjang
dc.contributor.authorChen, Ssuwei
dc.contributor.authorWähler, Tobias
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLiang, Ted
dc.contributor.authorChen, Robert J.
dc.contributor.authorDietze, Uwe
dc.date.accessioned2021-10-18T21:38:24Z
dc.date.available2021-10-18T21:38:24Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17994
dc.sourceIIOimport
dc.titleTechniques for removal of contamination from EUVL mask without surface damage
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76360Y
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, vol.7636


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