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Impact of iron contamination and SC1 generated roughness on 5nm gate oxides

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKnotter, D. M.
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-30T08:04:47Z
dc.date.available2021-09-30T08:04:47Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1805
dc.sourceIIOimport
dc.titleImpact of iron contamination and SC1 generated roughness on 5nm gate oxides
dc.typeOral presentation
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceProductronica Conference : Semiconductor Equipment and Materials - Contamination Control and Defect Reductions; 11-14 November 1
dc.source.conferencelocation
imec.availabilityPublished - imec


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