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Galvanic corrosion issues related to copper/barrier CMP via inline electrochemical measurements

dc.contributor.authorTeugels, Lieve
dc.contributor.authorNagar, Magi
dc.contributor.authorLi, Yunlong
dc.contributor.authorHeylen, Nancy
dc.date.accessioned2021-10-18T22:17:16Z
dc.date.available2021-10-18T22:17:16Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18079
dc.sourceIIOimport
dc.titleGalvanic corrosion issues related to copper/barrier CMP via inline electrochemical measurements
dc.typeProceedings paper
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.source.peerreviewyes
dc.source.conference15th International Symposium on Chemical-Mechanical Planarization - CMP
dc.source.conferencedate8/08/2010
dc.source.conferencelocationLake Placid, NY USA
imec.availabilityPublished - imec


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