dc.contributor.author | Urbanowicz, Adam | |
dc.contributor.author | Cremel, Maxime | |
dc.contributor.author | Vanstreels, Kris | |
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-18T22:33:40Z | |
dc.date.available | 2021-10-18T22:33:40Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18114 | |
dc.source | IIOimport | |
dc.title | Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Vanstreels, Kris | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | Vanstreels, Kris::0000-0002-4420-0966 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.conference | 3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM | |
dc.source.conferencedate | 4/03/2010 | |
dc.source.conferencelocation | Grenoble France | |
imec.availability | Published - imec | |