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Adsorption and desorption of hydrogen on Si(100) in H2 or Ar heat treatment

dc.contributor.authorUto, Atsushi
dc.contributor.authorSakuraba, Masao
dc.contributor.authorCaymax, Matty
dc.contributor.authorMurota, Junichi
dc.date.accessioned2021-10-18T22:36:57Z
dc.date.available2021-10-18T22:36:57Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18121
dc.sourceIIOimport
dc.titleAdsorption and desorption of hydrogen on Si(100) in H2 or Ar heat treatment
dc.typeMeeting abstract
dc.contributor.imecauthorCaymax, Matty
dc.source.peerreviewno
dc.source.beginpage25
dc.source.endpage26
dc.source.conference5th International Workshop on New Group IV Semiconductor Nanoelectronics
dc.source.conferencedate29/01/2010
dc.source.conferencelocationSendai Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings distributed at the Workshop only


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