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Line width roughness mitigation in chemically amplified resist by post-litho processes

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-18T22:38:40Z
dc.date.available2021-10-18T22:38:40Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18125
dc.sourceIIOimport
dc.titleLine width roughness mitigation in chemically amplified resist by post-litho processes
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1127
dc.source.endpage1130
dc.source.journalMicroelectronic Engineering
dc.source.issue5_8
dc.source.volume87
imec.availabilityPublished - open access
imec.internalnotespaper MNE 2009


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