Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Line width roughness mitigation in chemically amplified resist by post-litho processes
Publication:
Line width roughness mitigation in chemically amplified resist by post-litho processes
Copy permalink
Date
2010
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
20475.pdf
603.21 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1818
since deposited on 2021-10-18
Acq. date: 2025-12-18
Citations
Metrics
Views
1818
since deposited on 2021-10-18
Acq. date: 2025-12-18
Citations