Mask line roughness contribution in EUV lithography
dc.contributor.author | Vaglio Pret, Alessandro | |
dc.contributor.author | Gronheid, Roel | |
dc.date.accessioned | 2021-10-18T22:39:03Z | |
dc.date.available | 2021-10-18T22:39:03Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18126 | |
dc.source | IIOimport | |
dc.title | Mask line roughness contribution in EUV lithography | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | 36th International Conference on Micro & Nano Engineering - MNE | |
dc.source.conferencedate | 20/09/2010 | |
dc.source.conferencelocation | Genua Italy | |
imec.availability | Published - open access |