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Mask line roughness contribution in EUV lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-18T22:39:03Z
dc.date.available2021-10-18T22:39:03Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18126
dc.sourceIIOimport
dc.titleMask line roughness contribution in EUV lithography
dc.typeOral presentation
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference36th International Conference on Micro & Nano Engineering - MNE
dc.source.conferencedate20/09/2010
dc.source.conferencelocationGenua Italy
imec.availabilityPublished - open access


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