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Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorIshimoto, Toru
dc.contributor.authorSekiguchi, Kohei
dc.date.accessioned2021-10-18T22:40:22Z
dc.date.available2021-10-18T22:40:22Z
dc.date.issued2010
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18129
dc.sourceIIOimport
dc.titleResist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage41308
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume9
imec.availabilityPublished - open access


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