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Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Publication:
Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Date
2010
Journal article
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21463.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Ishimoto, Toru
;
Sekiguchi, Kohei
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1957
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1957
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations