Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography

dc.contributor.author	Vaglio Pret, Alessandro
dc.contributor.author	Gronheid, Roel
dc.contributor.author	Ishimoto, Toru
dc.contributor.author	Sekiguchi, Kohei
dc.contributor.imecauthor	Vaglio Pret, Alessandro
dc.contributor.imecauthor	Gronheid, Roel
dc.date.accessioned	2021-10-18T22:40:22Z
dc.date.available	2021-10-18T22:40:22Z
dc.date.embargo	9999-12-31
dc.date.issued	2010
dc.identifier.issn	1537-1646
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/18129
dc.source.beginpage	41308
dc.source.issue	4
dc.source.journal	Journal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume	9
dc.title	Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
dc.type	Journal article
dspace.entity.type	Publication
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