dc.contributor.author | Vaglio Pret, Alessandro | |
dc.contributor.author | Poliakov, Pavel | |
dc.contributor.author | Bianche, Davide | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Blomme, Pieter | |
dc.contributor.author | Miranda Corbalan, Miguel | |
dc.contributor.author | Van Houdt, Jan | |
dc.contributor.author | Dehaene, Wim | |
dc.date.accessioned | 2021-10-18T22:40:51Z | |
dc.date.available | 2021-10-18T22:40:51Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18130 | |
dc.source | IIOimport | |
dc.title | Roughness analysis for (EUV) optical lithography | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Blomme, Pieter | |
dc.contributor.imecauthor | Van Houdt, Jan | |
dc.contributor.imecauthor | Dehaene, Wim | |
dc.contributor.orcidimec | Van Houdt, Jan::0000-0003-1381-6925 | |
dc.source.peerreview | no | |
dc.source.conference | PRODI Workshop | |
dc.source.conferencedate | 12/07/2010 | |
dc.source.conferencelocation | Leuven Belgium | |
imec.availability | Published - imec | |