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Roughness analysis for (EUV) optical lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorPoliakov, Pavel
dc.contributor.authorBianche, Davide
dc.contributor.authorGronheid, Roel
dc.contributor.authorBlomme, Pieter
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDehaene, Wim
dc.date.accessioned2021-10-18T22:40:51Z
dc.date.available2021-10-18T22:40:51Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18130
dc.sourceIIOimport
dc.titleRoughness analysis for (EUV) optical lithography
dc.typeOral presentation
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDehaene, Wim
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewno
dc.source.conferencePRODI Workshop
dc.source.conferencedate12/07/2010
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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