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Wet etching of heavily doped Si in HF: a mechanistic study

dc.contributor.authorValckx, Nick
dc.date.accessioned2021-10-18T22:41:14Z
dc.date.available2021-10-18T22:41:14Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18131
dc.sourceIIOimport
dc.titleWet etching of heavily doped Si in HF: a mechanistic study
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conferenceKNCV Electrochemical Symposium
dc.source.conferencedate26/11/2010
dc.source.conferencelocationEindhoven Netherlands
imec.availabilityPublished - imec


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