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Apparent and steady-state etch rates in thin film etching and underetching of microstructures. II: Characterisation

dc.contributor.authorVan Barel, Gregory
dc.contributor.authorDu Bois, Bert
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorDe Wachter, Jef
dc.contributor.authorDe Ceuninck, Ward
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-18T22:46:21Z
dc.date.available2021-10-18T22:46:21Z
dc.date.issued2010
dc.identifier.issn0960-1317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18142
dc.sourceIIOimport
dc.titleApparent and steady-state etch rates in thin film etching and underetching of microstructures. II: Characterisation
dc.typeJournal article
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorDe Ceuninck, Ward
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.source.peerreviewyes
dc.source.beginpage55034
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.issue5
dc.source.volume20
dc.identifier.urlhttp://iopscience.iop.org/0960-1317/20/5/055034
imec.availabilityPublished - imec


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