Apparent and steady-state etch rates in thin film etching and underetching of microstructures. I: Modeling
dc.contributor.author | Van Barel, Gregory | |
dc.contributor.author | Mertens, Luc | |
dc.contributor.author | De Ceuninck, Ward | |
dc.contributor.author | Witvrouw, Ann | |
dc.date.accessioned | 2021-10-18T22:46:46Z | |
dc.date.available | 2021-10-18T22:46:46Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0960-1317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18143 | |
dc.source | IIOimport | |
dc.title | Apparent and steady-state etch rates in thin film etching and underetching of microstructures. I: Modeling | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Ceuninck, Ward | |
dc.source.peerreview | yes | |
dc.source.beginpage | 55033 | |
dc.source.journal | Journal of Micromechanics and Microengineering | |
dc.source.issue | 5 | |
dc.source.volume | 20 | |
imec.availability | Published - imec |
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