dc.contributor.author | Van Cauwenberghe, Marc | |
dc.contributor.author | Tutunjyan, Nina | |
dc.contributor.author | Jamieson, Geraldine | |
dc.contributor.author | Verdonck, Patrick | |
dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | Jourdain, Anne | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | Travaly, Youssef | |
dc.contributor.author | Swinnen, Bart | |
dc.date.accessioned | 2021-10-18T22:51:01Z | |
dc.date.available | 2021-10-18T22:51:01Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18153 | |
dc.source | IIOimport | |
dc.title | Si recess etch for 3D stacked IC applications. | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Van Cauwenberghe, Marc | |
dc.contributor.imecauthor | Tutunjyan, Nina | |
dc.contributor.imecauthor | Jamieson, Geraldine | |
dc.contributor.imecauthor | Verdonck, Patrick | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | Jourdain, Anne | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.imecauthor | Swinnen, Bart | |
dc.contributor.orcidimec | Jamieson, Geraldine::0000-0002-6750-097X | |
dc.contributor.orcidimec | Verdonck, Patrick::0000-0003-2454-0602 | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | no | |
dc.source.conference | 3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM | |
dc.source.conferencedate | 4/03/2010 | |
dc.source.conferencelocation | Grenoble France | |
imec.availability | Published - imec | |