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Comparison between existing inspection techniques for EUV mask defects

dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHendrickx, Eric
dc.contributor.authorCheng, Shaunee
dc.contributor.authorRonse, Kurt
dc.contributor.authorAbe, Tsukasa
dc.contributor.authorMagana, John
dc.contributor.authorBret, Tristan
dc.date.accessioned2021-10-18T22:53:43Z
dc.date.available2021-10-18T22:53:43Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18159
dc.sourceIIOimport
dc.titleComparison between existing inspection techniques for EUV mask defects
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate17/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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