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22nm node imaging and beyond: When will EUV take over?

dc.contributor.authorvan Setten, Eelco
dc.contributor.authorMouraille, Orion
dc.contributor.authorWittebrood, Friso
dc.contributor.authorDusa, Mircea
dc.contributor.authorvan Ingen-Schenau, Koen
dc.contributor.authorFinders, Jo
dc.contributor.authorFeenstra, Kees
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorErcken, Monique
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-18T23:14:22Z
dc.date.available2021-10-18T23:14:22Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18202
dc.sourceIIOimport
dc.title22nm node imaging and beyond: When will EUV take over?
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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