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Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma

dc.contributor.authorVanstreels, Kris
dc.contributor.authorUrbanowicz, Adam
dc.date.accessioned2021-10-18T23:33:18Z
dc.date.available2021-10-18T23:33:18Z
dc.date.issued2010
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18243
dc.sourceIIOimport
dc.titleNanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma
dc.typeJournal article
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.source.peerreviewyes
dc.source.beginpage173
dc.source.endpage179
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue1
dc.source.volume28
imec.availabilityPublished - imec


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