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Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma
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1881 since deposited on 2021-10-18
3last month
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Acq. date: 2026-10-12
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Statistics
Views
1881 since deposited on 2021-10-18
3last month
1last week
Acq. date: 2026-10-12
Citations