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Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma
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Authors
Vanstreels, Kris
;
Urbanowicz, Adam
ISSN
1071-1023
Issue
1
Journal
Journal of Vacuum Science and Technology B
Volume
28
Title
Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma
Publication type
Journal article
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