Publication:
Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma
Date
| dc.contributor.author | Vanstreels, Kris | |
| dc.contributor.author | Urbanowicz, Adam | |
| dc.contributor.imecauthor | Vanstreels, Kris | |
| dc.contributor.orcidimec | Vanstreels, Kris::0000-0002-4420-0966 | |
| dc.date.accessioned | 2021-10-18T23:33:18Z | |
| dc.date.available | 2021-10-18T23:33:18Z | |
| dc.date.issued | 2010 | |
| dc.identifier.issn | 1071-1023 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18243 | |
| dc.source.beginpage | 173 | |
| dc.source.endpage | 179 | |
| dc.source.issue | 1 | |
| dc.source.journal | Journal of Vacuum Science and Technology B | |
| dc.source.volume | 28 | |
| dc.title | Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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