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Diffractive optical element applied to proximity exposure lithography exploring partial light coherence

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCirino, Giuseppe
dc.contributor.authorMansano, Ronaldo
dc.contributor.authorGoncalves Neto, Luiz
dc.date.accessioned2021-10-18T23:41:42Z
dc.date.available2021-10-18T23:41:42Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18261
dc.sourceIIOimport
dc.titleDiffractive optical element applied to proximity exposure lithography exploring partial light coherence
dc.typeProceedings paper
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.conferenceLatin America Optics and Photonics Conference - LAOP
dc.source.conferencedate27/09/2010
dc.source.conferencelocationRecife Brazil
imec.availabilityPublished - imec


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