dc.contributor.author | Vermang, Bart | |
dc.contributor.author | Rothschild, Aude | |
dc.contributor.author | Bearda, Twan | |
dc.contributor.author | John, Joachim | |
dc.contributor.author | Poortmans, Jef | |
dc.contributor.author | Mertens, Robert | |
dc.date.accessioned | 2021-10-18T23:52:18Z | |
dc.date.available | 2021-10-18T23:52:18Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18283 | |
dc.source | IIOimport | |
dc.title | Thermal ALD for industrial Si solar cells: advanced cleaning | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Vermang, Bart | |
dc.contributor.imecauthor | John, Joachim | |
dc.contributor.imecauthor | Poortmans, Jef | |
dc.contributor.imecauthor | Mertens, Robert | |
dc.contributor.orcidimec | Vermang, Bart::0000-0003-2669-2087 | |
dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 206 | |
dc.source.endpage | 207 | |
dc.source.conference | 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS | |
dc.source.conferencedate | 19/09/2010 | |
dc.source.conferencelocation | Oostende Belgium | |
imec.availability | Published - open access | |
imec.internalnotes | P8.2 | |