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A reliability study of titanium silicide lines using micro-raman spectroscopy and electron microscopy

dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorHoward, Dave
dc.contributor.authorRasras, Mahmoud
dc.contributor.authorLauwers, A.
dc.contributor.authorMaex, Karen
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-09-30T08:08:11Z
dc.date.available2021-09-30T08:08:11Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1829
dc.sourceIIOimport
dc.titleA reliability study of titanium silicide lines using micro-raman spectroscopy and electron microscopy
dc.typeJournal article
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorGroeseneken, Guido
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1591
dc.source.endpage1594
dc.source.journalMicroelectronics and Reliability
dc.source.issue10_11
dc.source.volume37
imec.availabilityPublished - open access
imec.internalnotesSpecial Issue 8th European Sympoaium on Electron Devices, Failure Physics and Analysis (ESREF 97)


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