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Applicable solvent photoresist strip process for high-k/metal gate

dc.contributor.authorWada, M
dc.contributor.authorTakahashi, H
dc.contributor.authorSnow, J
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, PW
dc.contributor.authorShirakawa, H
dc.date.accessioned2021-10-19T00:11:25Z
dc.date.available2021-10-19T00:11:25Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18321
dc.sourceIIOimport
dc.titleApplicable solvent photoresist strip process for high-k/metal gate
dc.typeMeeting abstract
dc.contributor.imecauthorVos, Rita
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage78
dc.source.endpage79
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate20/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesPaper 6.6


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