Show simple item record

Effective solutions for in-fab EUVL mask cleaning

dc.contributor.authorWähler, Tobias
dc.contributor.authorSingh, Sherjang
dc.contributor.authorDietze, Uwe
dc.contributor.authorJonckheere, Rik
dc.contributor.authorBaudemprez, Bart
dc.date.accessioned2021-10-19T00:12:20Z
dc.date.available2021-10-19T00:12:20Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18323
dc.sourceIIOimport
dc.titleEffective solutions for in-fab EUVL mask cleaning
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate20/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


Files in this item

Thumbnail
Name:
21600.pdf
Size:
3.222Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record