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Fabrication of high qualtiy Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches

dc.contributor.authorWang, Gang
dc.contributor.authorLoo, Roger
dc.contributor.authorTakeuchi, Shotaro
dc.contributor.authorSouriau, Laurent
dc.contributor.authorLin, Vic
dc.contributor.authorMoussa, Alain
dc.contributor.authorBender, Hugo
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorOng, Patrick
dc.contributor.authorLee, Willie
dc.contributor.authorMeuris, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBlanpain, Bart
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-19T00:15:55Z
dc.date.available2021-10-19T00:15:55Z
dc.date.issued2010
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18330
dc.sourceIIOimport
dc.titleFabrication of high qualtiy Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewyes
dc.source.beginpage2538
dc.source.endpage2541
dc.source.journalThin Solid Films
dc.source.issue9
dc.source.volume518
imec.availabilityPublished - imec
imec.internalnotesE-MRS 2009 Summer Meeting I


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