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In situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/low-k damascene interconnects using synchrotron radiation

dc.contributor.authorWilson, Chris
dc.contributor.authorVolders, Henny
dc.contributor.authorCroes, Kristof
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorBeyer, Gerald
dc.contributor.authorHorsfall, Alton B.
dc.contributor.authorO'Neill, Anthony G.
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-19T00:30:32Z
dc.date.available2021-10-19T00:30:32Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18359
dc.sourceIIOimport
dc.titleIn situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/low-k damascene interconnects using synchrotron radiation
dc.typeJournal article
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.identifier.doi10.1016/j.mee.2009.06.023
dc.source.peerreviewyes
dc.source.beginpage398
dc.source.endpage401
dc.source.journalMicroelectronic Engineering
dc.source.issue3
dc.source.volume87
imec.availabilityPublished - open access


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