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Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node

dc.contributor.authorWong, Patrick
dc.contributor.authorGronheid, Roel
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVandenbroeck, Nadia
dc.date.accessioned2021-10-19T00:35:39Z
dc.date.available2021-10-19T00:35:39Z
dc.date.issued2010
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18368
dc.sourceIIOimport
dc.titleThree litho-process-litho approaches for 2D double patterning at the 32nm half pitch node
dc.typeJournal article
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage185
dc.source.endpage192
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue2
dc.source.volume23
imec.availabilityPublished - open access


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