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Double patterning induced process bias induced for various LPL alternatives

dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorWiaux, Vincent
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T00:36:07Z
dc.date.available2021-10-19T00:36:07Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18369
dc.sourceIIOimport
dc.titleDouble patterning induced process bias induced for various LPL alternatives
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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