dc.contributor.author | Xu, XiuMei | |
dc.contributor.author | Pacco, Antoine | |
dc.contributor.author | Wada, Masayuki | |
dc.contributor.author | Leunissen, Peter | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Mertens, Paul | |
dc.date.accessioned | 2021-10-19T00:40:20Z | |
dc.date.available | 2021-10-19T00:40:20Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18378 | |
dc.source | IIOimport | |
dc.title | Uniformity of particle removal by aerosol spray | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Xu, XiuMei | |
dc.contributor.imecauthor | Pacco, Antoine | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.orcidimec | Xu, XiuMei::0000-0002-3356-8693 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 18 | |
dc.source.endpage | 19 | |
dc.source.conference | 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS | |
dc.source.conferencedate | 19/09/2010 | |
dc.source.conferencelocation | Oostende Belgium | |
imec.availability | Published - open access | |