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dc.contributor.authorXu, XiuMei
dc.contributor.authorPacco, Antoine
dc.contributor.authorWada, Masayuki
dc.contributor.authorLeunissen, Peter
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-19T00:40:20Z
dc.date.available2021-10-19T00:40:20Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18378
dc.sourceIIOimport
dc.titleUniformity of particle removal by aerosol spray
dc.typeMeeting abstract
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage18
dc.source.endpage19
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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