Authors

Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee

Conference

Metrology, Inspection and Process Control for Microlithography XXIV

Title

Application of model-based library approach to photoresist pattern shape measurement in advenced lithography

Publication type

Proceedings paper

Embargo date

9999-12-31