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Optimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTs

dc.contributor.authorYou, Shuzhen
dc.contributor.authorVan Huylenbroeck, Stefaan
dc.contributor.authorNguyen, Duy
dc.contributor.authorSibaja-Hernandez, Arturo
dc.contributor.authorVenegas, Rafael
dc.contributor.authorVan Wichelen, Koen
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-19T00:49:39Z
dc.date.available2021-10-19T00:49:39Z
dc.date.issued2010
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18397
dc.sourceIIOimport
dc.titleOptimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTs
dc.typeJournal article
dc.contributor.imecauthorYou, Shuzhen
dc.contributor.imecauthorVan Huylenbroeck, Stefaan
dc.contributor.imecauthorSibaja-Hernandez, Arturo
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecVan Huylenbroeck, Stefaan::0000-0001-9978-3575
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.source.peerreviewyes
dc.source.beginpageS68
dc.source.endpageS71
dc.source.journalThin Solid Films
dc.source.issue6, Suppl. 1
dc.source.volume518
dc.identifier.urlhttp://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-4XGPKGB-J&_user=799533&_coverDate=01%2F01%2F2010&_rdoc=1&_fmt=&_o
imec.availabilityPublished - imec


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