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Study of intrinsic low-k properties for interconnect scaling

dc.contributor.authorZhao, Larry
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-19T01:01:45Z
dc.date.available2021-10-19T01:01:45Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18421
dc.sourceIIOimport
dc.titleStudy of intrinsic low-k properties for interconnect scaling
dc.typeMeeting abstract
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate8/03/2010
dc.source.conferencelocationMechelen Belgium
imec.availabilityPublished - open access


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