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Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch
Publication:
Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Altamirano Sanchez, Efrain
;
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Demand, Marc
;
Boullart, Werner
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1890
since deposited on 2021-10-19
Acq. date: 2026-02-24
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Views
1890
since deposited on 2021-10-19
Acq. date: 2026-02-24
Citations