Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch

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Authors
Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Gronheid, Roel; Demand, Marc; Boullart, Werner
Conference
AVS 58th International Symposium and Exhibition
Title
Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch
Publication type
Oral presentation
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