dc.contributor.author | Armini, Silvia | |
dc.contributor.author | Verdonck, Patrick | |
dc.contributor.author | Loyo Prado, Jana | |
dc.contributor.author | Krishtab, Mikhail | |
dc.contributor.author | Swerts, Johan | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Meerschaut, Johan | |
dc.contributor.author | Kim, Tae-Gon | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Le Quoc, Toan | |
dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Leunissen, Peter | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-19T12:29:39Z | |
dc.date.available | 2021-10-19T12:29:39Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18490 | |
dc.source | IIOimport | |
dc.title | Pore sealing of porous low-k films by SAMs for ALD | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Armini, Silvia | |
dc.contributor.imecauthor | Verdonck, Patrick | |
dc.contributor.imecauthor | Loyo Prado, Jana | |
dc.contributor.imecauthor | Krishtab, Mikhail | |
dc.contributor.imecauthor | Swerts, Johan | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.orcidimec | Armini, Silvia::0000-0003-0578-3422 | |
dc.contributor.orcidimec | Verdonck, Patrick::0000-0003-2454-0602 | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.source.peerreview | no | |
dc.source.conference | ALD for Nanotechnology Applications | |
dc.source.conferencedate | 28/11/2011 | |
dc.source.conferencelocation | Leuven Belgium | |
dc.identifier.url | http://www2.imec.be/be_en/education/conferences/ald-workshop.html | |
imec.availability | Published - imec | |