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Challenges of aggressive scaling of ultra low-k dielectric materials

dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-19T12:31:09Z
dc.date.available2021-10-19T12:31:09Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18518
dc.sourceIIOimport
dc.titleChallenges of aggressive scaling of ultra low-k dielectric materials
dc.typeMeeting abstract
dc.source.peerreviewno
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate13/03/2011
dc.source.conferencelocationMontreal Canada
imec.availabilityPublished - imec


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