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Sub 3 nm gate oxide growth and reliability

dc.contributor.authorDepas, Michel
dc.contributor.authorHeyns, Marc
dc.contributor.authorSprey, Hessel
dc.contributor.authorWilhelm, Rudi
dc.date.accessioned2021-09-30T08:11:52Z
dc.date.available2021-09-30T08:11:52Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1853
dc.sourceIIOimport
dc.titleSub 3 nm gate oxide growth and reliability
dc.typeOral presentation
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorSprey, Hessel
dc.source.peerreviewno
dc.source.conferenceMaterials Research Society 1997 Spring Meeting : Symposium on Materials Reliability in Microelectronics VII; March 31 - April 3,
dc.source.conferencelocation
imec.availabilityPublished - imec


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