dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Van Look, Lieve | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Van Adrichem, Paul | |
dc.contributor.author | Maslow, Mark J. | |
dc.contributor.author | Gemmink, Jan-Willem | |
dc.contributor.author | Cao, Hua | |
dc.contributor.author | Hunsche, Stefan | |
dc.contributor.author | Neumann, Jens Timo | |
dc.contributor.author | Wolf, Alexander | |
dc.date.accessioned | 2021-10-19T12:32:42Z | |
dc.date.available | 2021-10-19T12:32:42Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18542 | |
dc.source | IIOimport | |
dc.title | Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Van Look, Lieve | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Van Adrichem, Paul | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 79730V | |
dc.source.conference | Optical Microlithography XXIV | |
dc.source.conferencedate | 27/02/2011 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE, Vol. 7973 | |