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Investigation on the drying dynamics of millimetric water droplets: source of watermarks on silicon wafers

dc.contributor.authorBelmiloud, Naser
dc.contributor.authorMertens, Paul
dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-19T12:32:50Z
dc.date.available2021-10-19T12:32:50Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18544
dc.sourceIIOimport
dc.titleInvestigation on the drying dynamics of millimetric water droplets: source of watermarks on silicon wafers
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.source.peerreviewno
dc.source.beginpage2059
dc.source.conference220th ECS Meeting Symposium E7: Semiconductor Cleaning Science and Technology 12
dc.source.conferencedate9/10/2011
dc.source.conferencelocationboston, MA USA
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. MA2011-02


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