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Investigation on the drying dynamics of millimetric water droplets: source of watermarks on silicon wafers

dc.contributor.authorBelmiloud, Naser
dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorMertens, Paul
dc.contributor.authorXu, XiuMei
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-19T12:32:54Z
dc.date.available2021-10-19T12:32:54Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18545
dc.sourceIIOimport
dc.titleInvestigation on the drying dynamics of millimetric water droplets: source of watermarks on silicon wafers
dc.typeProceedings paper
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage205
dc.source.endpage212
dc.source.conferenceSemiconductor Cleaning Science and Technology 12 - SCST12
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 41, Issue 5


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