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Mandrel-based patterning: density multiplication techniques for15nm nodes

dc.contributor.authorBencher, Chris
dc.contributor.authorDai, Huixiong
dc.contributor.authorMiao, Liyan
dc.contributor.authorChen, Yongmei
dc.contributor.authorXu, Ping
dc.contributor.authorChen, Yijian
dc.contributor.authorOemardani, Shiany
dc.contributor.authorSweis, Jason
dc.contributor.authorWiaux, Vincent
dc.contributor.authorHermans, Jan
dc.contributor.authorChang, Li-Wen
dc.contributor.authorBao, Xinyu
dc.contributor.authorYi, He
dc.contributor.authorWong, H.-S. Philippe
dc.date.accessioned2021-10-19T12:33:09Z
dc.date.available2021-10-19T12:33:09Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18548
dc.sourceIIOimport
dc.titleMandrel-based patterning: density multiplication techniques for15nm nodes
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79730K
dc.source.conferenceOptical Microlithography XXIV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7973


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